Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1998-04-24
1999-10-12
Picardat, Kevin M.
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438106, 438108, 438118, H01L 2144
Patent
active
059666307
ABSTRACT:
A wire bonding method in which an electric spark is generated between a lower end of a wire inserted through a capillary tool and a torch so as to form a small diameter ball, and then the electric spark is again generated so as to increase the diameter of the ball to form a large ball. The large ball is pressed against a pad on a chip with a lower surface of the capillary tool, so that the large ball is bonded to the pad. Since the large ball is soft, it can be sufficiently crushed by the lower surface of the capillary tool and be tightly bonded to the pad. Accordingly, the method accomplishes excellent wire bonding immediately after a bonding operation is restarted even after a long waiting time between bonding operations.
REFERENCES:
patent: 5302550 (1994-04-01), Hirota et al.
patent: 5349234 (1994-09-01), DesJardin et al.
patent: 5668058 (1997-09-01), Tanioka et al.
Collins Deven
Matsushita Electric - Industrial Co., Ltd.
Picardat Kevin M.
LandOfFree
Wire bonding method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wire bonding method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wire bonding method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-661958