Winding type plasma CVD apparatus

Details Winding type plasma CVD apparatus Winding type plasma CVD apparatus

2011-03-01

2011-03-01

Moore, Karla (Department: 1712)

Coating apparatus

Gas or vapor deposition

Running length work

C156S345200, C204S298240

Reexamination Certificate

active

07896968

ABSTRACT:
The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.

REFERENCES:
patent: 4412507 (1983-11-01), Kitamoto et al.
patent: 5053252 (1991-10-01), Kimura et al.
patent: 5514217 (1996-05-01), Niino et al.
patent: 5595792 (1997-01-01), Kashiwaya et al.
patent: 6220202 (2001-04-01), Foster et al.
patent: 2001/0050057 (2001-12-01), Yonezawa et al.
patent: 2002/0144656 (2002-10-01), Yoshikawa et al.
patent: 2002/0170877 (2002-11-01), Fazio et al.
patent: 2003/0172873 (2003-09-01), Fischer et al.
patent: 2004/0149214 (2004-08-01), Hirose et al.
patent: 2005/0255257 (2005-11-01), Choi et al.
patent: 2005/0274319 (2005-12-01), Strip et al.
patent: 2007/0134426 (2007-06-01), Hayashi et al.
patent: 64-075680 (1989-03-01), None
patent: 07-233474 (1995-09-01), None
patent: 2000-054151 (2000-02-01), None
patent: 2002-151513 (2002-05-01), None
patent: 2002-212744 (2002-07-01), None
patent: 2002-339075 (2002-11-01), None
patent: 2003-179043 (2003-06-01), None

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