Wide-field exposure optical system

Details Wide-field exposure optical system Wide-field exposure optical system

1993-03-03

1995-09-05

Ben, Loha

Optical: systems and elements

Lens

With reflecting element

359736, G02B 1700

Patent

active

054484162

ABSTRACT:
A wide-field exposure optical system in which the projection is performed by scanning an object to be projected with a predetermined scan width. The optical system comprises an illuminating section for illuminating the object to be projected in a circular arc region, a reflecting and refracting optical system for correcting the aberration of a circular arc region having its center on the optical axis and for forming, within an image surface, an image of the object to be projected illuminated by the illuminating section as a circular arc, a driving means for moving light-receiving members arranged on the object to be projected and on the image surface relative to the illuminating section and the reflecting and refracting optical system, and the reflecting and refracting optical system being formed by a first lens group, a second lens group and one concave mirror. The second lens group comprises a second lens which is a convex lens and a third lens which is a concave lens.

REFERENCES:
patent: 3748015 (1973-07-01), Offner
patent: 4711535 (1987-12-01), Shafer
Suzuki, A., "Complete Analysis of a Two-Mirror Unit Magnification System. Parts 1 and 2", Applied Optics, vold. 22, No. 24, Dec. 15, 1983, pp. 3943-3956.

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