Wet station apparatus having quartz heater monitoring system and

Details Wet station apparatus having quartz heater monitoring system and Wet station apparatus having quartz heater monitoring system and

1996-10-23

1999-08-31

Brenerman, Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 84, 216 86, C23F 102

Patent

active

059449390

ABSTRACT:
A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.

REFERENCES:
patent: 4350553 (1982-09-01), Mendes
patent: 5635827 (1997-06-01), Judd et al.

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