Wet station apparatus having quartz heater monitoring system and

Etching a substrate: processes – Nongaseous phase etching of substrate – With measuring – testing – or inspecting

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216 86, C23F 102, G05D 2300, H05B 100

Patent

active

060599863

ABSTRACT:
A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.

REFERENCES:
patent: Re32497 (1987-09-01), Canfield
patent: 4350553 (1982-09-01), Mendes
patent: 5635827 (1997-06-01), Judd et al.

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