Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1997-08-29
2000-02-22
Breneman, R. Bruce
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118715, C23F 102
Patent
active
060276029
ABSTRACT:
An apparatus for wet processing of substrates in a controlled environment. It is a single-substrate processing apparatus which is capable of carrying out etching, rinsing, and drying processes all in a single apparatus and in a controlled environment. A closed processing chamber is provided for processing a substrate in a closed environment. Processing liquids and gases are introduced into the chamber and the chamber is rotated with the substrate. Temperature inside the chamber is controlled by heating the gases. Humidity is controlled by varying the proportion of water vapor. The rotation of the chamber with the substrate creates a stable environment where processing parameters are more easily controlled.
REFERENCES:
patent: 4557785 (1985-12-01), Ohkuma
patent: 5571367 (1996-11-01), Nakajima et al.
Fu Ta-Hsing
Hung Ching-Chang Alex
Breneman R. Bruce
Chung David D.
Ho Lawrence Y. D.
Lui Jacqueline C.T.
Pacheco Liza
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