Wet-etch process and composition

Details Wet-etch process and composition Wet-etch process and composition

1992-07-16

1994-03-08

Dang, Thi

Compositions

Etching or brightening compositions

Alkali metal hydroxide containing

252 791, 156668, C09K 1300

Patent

active

052924459

ABSTRACT:
A wet-etch composition for polyamic acids and partially cured polyamic acids comprising an aqueous solution having a major portion of water, a substituted hydrocarbon solvent and a non-ionic base that is strong enough to deprotonate the polyamic acid or a partially cured polyamic acid in a weight ratio of 0.1-49:49-0.1, with the proviso that the composition contains less than 1.0 percent ionic base. The present invention further provides a process for wet-etching polyamic acids or partially cured polyamic acids.

REFERENCES:
patent: 4369090 (1983-01-01), Wilson et al.
patent: 4411735 (1983-10-01), Belani
patent: 4873136 (1989-10-01), Foust et al.

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