Wet cleaning cavitation system and method to remove...

Details Wet cleaning cavitation system and method to remove... Wet cleaning cavitation system and method to remove...

2008-05-20

2008-05-20

Markoff, Alexander (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S102200, C134S902000

Reexamination Certificate

active

10402593

ABSTRACT:
A cavitation cleaning system and method for using the same to remove particulate contamination from a substrate including providing at least one substrate immersed in a cleaning solution said cleaning solution contained in a cleaning solution container. The container further includes means for producing gaseous cavitation bubbles of ultrasound energy, said gaseous cavitation bubbles arranged to contact at least a portion of the at least one substrate; applying ultrasound energy to create gaseous cavitation bubbles to contact the substrate to remove adhering residual particles in a substrate surface cleaning process; and, recirculating the cleaning solution through a particulate filtering means.

REFERENCES:
patent: 5365960 (1994-11-01), Bran
patent: 6048405 (2000-04-01), Skrovan et al.
patent: 6240938 (2001-06-01), Oshinowo
patent: 6488037 (2002-12-01), Guldi
patent: 05013397 (1993-01-01), None
Kern, Handbook of Semiconductor Wafer Cleaning Technologu, 1993, Noyes Publication, pp. 48-52 and 141-142.
English translation of JP 05-13397.

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