Wet cleaning cavitation system and method to remove...

Details Wet cleaning cavitation system and method to remove... Wet cleaning cavitation system and method to remove...

2008-05-20

2008-05-20

Markoff, Alexander (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S102200, C134S902000

Reexamination Certificate

active

07373941

ABSTRACT:
A cavitation cleaning system and method for using the same to remove particulate contamination from a substrate including providing at least one substrate immersed in a cleaning solution said cleaning solution contained in a cleaning solution container. The container further includes means for producing gaseous cavitation bubbles of ultrasound energy, said gaseous cavitation bubbles arranged to contact at least a portion of the at least one substrate; applying ultrasound energy to create gaseous cavitation bubbles to contact the substrate to remove adhering residual particles in a substrate surface cleaning process; and, recirculating the cleaning solution through a particulate filtering means.

REFERENCES:
patent: 5365960 (1994-11-01), Bran
patent: 6048405 (2000-04-01), Skrovan et al.
patent: 6240938 (2001-06-01), Oshinowo
patent: 6488037 (2002-12-01), Guldi
patent: 05013397 (1993-01-01), None
Kern, Handbook of Semiconductor Wafer Cleaning Technologu, 1993, Noyes Publication, pp. 48-52 and 141-142.
English translation of JP 05-13397.

Affiliated with

Also associated with

Rating

Wet cleaning cavitation system and method to remove... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wet cleaning cavitation system and method to remove..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wet cleaning cavitation system and method to remove... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2756451