Wet chemical etching of crxsiynz

Details Wet chemical etching of crxsiynz Wet chemical etching of crxsiynz

1983-12-23

1987-11-03

Czaja, Donald E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156657, 156662, 156664, 252 793, B44C 122

Patent

active

047041889

ABSTRACT:
Thin films of chromium/silicon
itrogen are etched in a solution of HF, H.sub.2 O.sub.2, HCl, and H.sub.2 O.

REFERENCES:
patent: 3423260 (1969-01-01), Heath et al.
patent: 4100014 (1978-07-01), Kuhn-Kuhnenfeld et al.
patent: 4392992 (1983-07-01), Paulson et al.

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