Wet chemical etchant and method for etching high temperature sup

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156656, 156667, 20419224, 252 791, 252 794, 427 62, 505820, B44C 122, C23F 102, C03C 1500, C09K 1300

Patent

active

049975226

ABSTRACT:
A system for etching superconducting films of yttrium-barium-copper-oxide (YBa.sub.2 Cu.sub.3 O.sub.2) is disclosed. The etchant comprises ethylenediaminetetraacetic acid of varying concentrations in water or a water/glycerol mixture. The described etchant permits superconducting transition temperatures to remain unaffected within the experimental accuracy of 1.degree. C. Additionally, films do not require reoxygenation after etching, and the etchant is suitable for micropatterning using standard photolithography.

REFERENCES:
patent: 4554050 (1985-11-01), Minford et al.
Yoshizako et al., "Chemical Etching of High-Tc Superconducting Y-Ba-Cu-O Films in Phosphoric Acid Solution", Japanese Journal of Applied Physics, vol. 26, No. 9, Sep. 1987, pp. L1533-L1534.
"High-Resolution Patterning of High T.sub.c Superconductors", L. R. Harriott et al., Appl. Phys. Lett. 55 (5), pp. 495-497, Jul. 31, 1989.
"Nonaqueous Chemical Etch for YBa.sub.2 Cu.sub.3 O.sub.7-x," R. P. Vasquez et al., Appl. Phys. Lett. 53 (26), pp. 2692-2694, Dec. 26, 1988.
"Focused Ion Beam Processes for High-T.sub.c Superconductors," S. Matsui et al., J. Vac. Sci. Technol. B6 (3), pp. 900-905, May/Jun. 1988.

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