Wave guided alternating phase shift mask and fabrication...

Details Wave guided alternating phase shift mask and fabrication... Wave guided alternating phase shift mask and fabrication...

2005-07-19

2005-07-19

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06919149

ABSTRACT:
A wave guided alternating phase shift mask (WGAPSM) includes a substrate transparent to light from an exposure light source and a waveguide pattern formed on the substrate to define a plurality of transparent regions that are regularly arranged. The transparent regions defined by the waveguide pattern include a plurality of shift transparent regions formed of recess regions of the substrate and a plurality of non-shift transparent regions alternatively arranged with the shift transparent regions. The provided WGAPSM minimizes an error of critical dimension difference and an X-effect while securing a large process margin and not generating opaque defects. A fabricating method for the provided WGAPSM is also provided.

REFERENCES:
patent: 5932378 (1999-08-01), Lee
patent: 1999-0065307 (1999-08-01), None

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