Waterborne photoresists having polysiloxanes

Details Waterborne photoresists having polysiloxanes Waterborne photoresists having polysiloxanes

1994-03-30

1995-02-07

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430906, 430910, 522 85, 522110, G03C 173

Patent

active

053874943

ABSTRACT:
A waterborne photoimageable composition or photoresist comprises a latex binder polymer having sufficient carboxylic acid functionality to render it developable in alkaline aqueous solution, a photopolymerizeable monomer fraction, a photoinitiator chemical system and a poly(siloxane(s)).

REFERENCES:
patent: 5045435 (1991-09-01), Adams et al.
patent: 5268256 (1993-12-01), Goetz et al.

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