Waterborne photoresists having non-ionic fluorocarbon surfactant

Details Waterborne photoresists having non-ionic fluorocarbon surfactant Waterborne photoresists having non-ionic fluorocarbon surfactant

1994-04-06

1995-02-14

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430906, 430910, 522 85, 522110, G03C 178

Patent

active

053894952

ABSTRACT:
A waterborne photoimageable composition or photoresist comprises a latex binder polymer having sufficient carboxylic acid functionality to render it developable in alkaline aqueous solution, a photopolymerizeable monomer fraction, a photoinitiator chemical system and surfactant which is a fluoroaliphatic oxyethylene adduct.

REFERENCES:
patent: 5045435 (1991-09-01), Adams et al.
"Application of fluorochemical sufactants in high-solids and water-borne coatings" Dr. Jeffrey G. Linert & Dr. J. N. Chasman, pp. 37-43 American Paint and Coatings Journal.

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