Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-06-06
1999-02-09
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302851, 430910, 430911, 522 84, 522121, G03F 7033
Patent
active
058692207
ABSTRACT:
Highly versatile stable photoresist emulsions can be prepared using low levels of neutralization while minimizing the use of surfactants and associative thickeners. High solids, low viscosity waterborne photoresist emulsion compositions are prepared by mixing and comminuting a partially neutralized acid functional latex polymer resin with photopolymerizable monomers and photoinitiators under conditions sufficient to produce a stable emulsion.
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Hallock John Scott
Samukawa Hiroshi
Cordani John L.
Hamilton Cynthia
MacDermid Acumen, Inc.
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