Water soluble photosensitive resin compositions comprising a pol

Details Water soluble photosensitive resin compositions comprising a pol Water soluble photosensitive resin compositions comprising a pol

1979-01-29

1980-09-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 20415915, G03C 168

Patent

active

042207045

ABSTRACT:
A photosensitive resin composition which comprises a polymer having a basic nitrogen atom in the main or side chain, which is represented by the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.3 representing a polymeric chain, a photopolymerizable unsaturated monomer and a photosensitizer.

REFERENCES:
patent: 3486903 (1969-12-01), Henkler et al.
patent: 3551148 (1970-12-01), Faulhaber et al.
patent: 3684516 (1972-08-01), Ishii et al.
patent: 3832188 (1974-08-01), Bamba et al.
patent: 3873319 (1975-03-01), Berg
patent: 4145222 (1979-03-01), Etoh et al.

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