Water-soluble photoresist composition

Details Water-soluble photoresist composition Water-soluble photoresist composition

1998-07-07

1999-09-07

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430197, 4302891, G03F 7008, G03F 704

Patent

active

059485922

ABSTRACT:
A water-soluble photoresist composition is provided which comprises a water-soluble photosensitive composition containing a casein component and a water-soluble photosensitive agent and at least one calcium salt of an organic acid. The photoresist composition has excellent sensitivity, resolution, and etching resistance and can be used for the production of highly refined electronic components such as shadow masks, lead frame, etc.

REFERENCES:
patent: 2692826 (1954-10-01), Neugebauer et al.
patent: 4211563 (1980-07-01), Goldman
Sawada et al. 124:71615 File HCA of STN Database Service, Chemical Abstracts, American Chemical Society, 1997, English Abstract of JP 07 207464.
Sawada et al. Accession No. 95-309549/40, On-line Derwent Abstract, File WPAT, English Abstract of JP 07207464, Published Aug. 8, 1995.
Sawada et al. Accession No. 95-207464, File JAPIO, English abstract of JP 07207464 published Aug. 8, 1995.

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