Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1994-03-29
1996-06-25
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430329, 430256, 134 2, 134 38, 134 40, 134 42, 252143, 252158, 252170, 25217421, 252DIG8, G03C 500, C11D 708, C03C 2300, B08B 700
Patent
active
055298877
ABSTRACT:
A coating-removing solution for photo-cross-linked and thermally cross-linked photoresist masks and solder resist masks cross-linked by exposure to light and heat and which solution contains a diglycol monoalkyl ether, a glycol monoalkyl ether, an alkali hydroxide, water, and a water-soluble fluoride.
REFERENCES:
patent: 3250644 (1966-05-01), Marcus
patent: 4165295 (1979-08-01), Vander Mey
patent: 4215005 (1980-07-01), Vander Mey
patent: 4592787 (1986-06-01), Johnson
patent: 5236552 (1993-08-01), Fang
patent: 5304252 (1994-04-01), Condra et al.
Julius Grant, Hackh's Chemical Dictionary 4th Ed., p. 274, 1969.
Derwent English Language Abstract Of JP-1310356.
Vol. 14 No. 366 English Language Abstract Of JP-2135352.
Vol. 15 No. 316 English Language Abstract Of JP-3113450.
Horn Klaus
Lingnau Jurgen
Martens Klaus-Peter
Codd Bernard P.
Kottis Nick C.
Lesmes George F.
Morton International Inc.
White Gerald K.
LandOfFree
Water soluble fluoride-containing solution for removing cured ph does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water soluble fluoride-containing solution for removing cured ph, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water soluble fluoride-containing solution for removing cured ph will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2188006