Water-soluble film forming composition

Details Water-soluble film forming composition Water-soluble film forming composition

1995-09-20

1996-06-25

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

4302711, 4302731, 430315, 430324, G03C 500

Patent

active

055298885

ABSTRACT:
A water-soluble composition comprising a water-soluble N-vinylpyrrolidone copolymer and a fluorinated organic acid in a weight ratio of from 20:80 to 70:30 is useful in forming a water-soluble overlying film on a chemically amplified resist layer. The overlying film functions as both an anti-reflective film and a protective film during resist pattern formation by photolithography.

REFERENCES:
patent: H623 (1989-04-01), Miyazako
patent: 4784936 (1988-11-01), White et al.
patent: 4786581 (1988-11-01), Stahlhofen et al.

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