Ammunition and explosives – Blasting – Contained blasting charge
Patent
1990-08-27
1993-05-18
Nelson, Peter A.
Ammunition and explosives
Blasting
Contained blasting charge
102302, 102364, 149 22, 1491082, 42 114, F42B 300, F42B 1314
Patent
active
052123430
ABSTRACT:
Devices and methods are disclosed for contacting a hot reaction mass with water to initiate an explosive reaction. The reaction mass comprises a ceramic or intermetallic material that is produced by exothermically reacting a mixture of reactive elements. Suitable reaction masses include borides and/or carbides that are formed by reacting a mixture comprising B and/or C in combination with an element selected from Ti, V, Cr, Zr, Nb, Mo, Hf, Ta and W. Additional metals such as Al, Li, Mg, Zn, Cu, Be, Na, K, Ca, Rb, Y, U and Cs may also be present in the reactive mixture. In operation, the hot reaction mass is contacted with water to initiate an explosive water reaction and to produce large volumes of hydrogen containing gas.
REFERENCES:
patent: H464 (1988-05-01), Lee et al.
patent: 3111439 (1963-11-01), Brunauer
patent: 3137993 (1964-06-01), Tyson, Jr.
patent: 3353349 (1967-11-01), Percival
patent: 3377955 (1968-04-01), Hodgson
patent: 3388554 (1968-06-01), Hodgson
patent: 3986909 (1976-10-01), Macri
patent: 4034497 (1977-07-01), Yanda
patent: 4188884 (1980-02-01), White et al.
patent: 4280409 (1981-07-01), Rozner et al.
patent: 4331080 (1982-05-01), West et al.
patent: 4432818 (1984-02-01), Givens
Bennett Russell N.
Bopp Alvin F.
Boxall Larry G.
Brupbacher John M.
Buchta William M.
Chin Gay
Martin Marietta Corporation
Nelson Peter A.
Towner Alan G.
Winchell Bruce M.
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