Water-developing photosensitive resin composition

Details Water-developing photosensitive resin composition Water-developing photosensitive resin composition

1996-05-31

1999-01-19

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, 430910, 430907, 522116, 522110, 522121, G03F 7033

Patent

active

058612327

ABSTRACT:
The present invention provides a photosensitive resin composition which is superior in water-developing properties, resilience, strength of resin plate after exposure, elongation at break, and transparency of resin plate. The composition comprises:

REFERENCES:
patent: 4916254 (1990-04-01), Watanabe et al.
patent: 5073477 (1991-12-01), Kusuda et al.
patent: 5175076 (1992-12-01), Ishikawa et al.
patent: 5344744 (1994-09-01), Ueda et al.
patent: 5476752 (1995-12-01), Noguchi et al.
Grant et al, Grant&Hackh's Chemical Dictionary, fifth ed. McGraw-Hill Book Company, New York, NY 1987, p. 309.
Database WPI, Section Ch, Week 8934, Derwent Publiations Ltd., London, GB; Class A89, AN 89-245523, XP002012658 & JP-A-01 179 146 (Tokyo Oka Kogyo KK), Jul. 17, 1989 *abstract*.

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