Water developable photosensitive resinous composition

Details Water developable photosensitive resinous composition Water developable photosensitive resinous composition

1985-06-13

1986-08-05

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430283, 430288, 522113, G03C 168

Patent

active

046043438

ABSTRACT:
A water developable photosensitive resin composition comprising a water soluble polymer, photopolymerizable unsaturated monomer(s) and a photopolymerization initiator, which is characterized in that as the whole or a part of said photopolymerizable unsaturated monomer(s), there is employed a product made by mixing of 1 mole of urea, thiourea or an alkyl derivative thereof and 0.75 to 1.3 moles of an N-alkylol acryl amide or an N-alkylol methacrylamide. The composition is useful for an image formation through a photopolymerization reaction and developable by water treatment to give a soft and rubber like resilient cured product.

REFERENCES:
patent: 3801638 (1974-04-01), Cerwonka
patent: 3809633 (1974-05-01), Magnotta et al.
patent: 3833384 (1974-09-01), Noonan et al.
patent: 4209581 (1980-06-01), Takanashi et al.

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