Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-01-24
2006-01-24
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S285100, C430S910000, C522S110000
Reexamination Certificate
active
06989226
ABSTRACT:
An object of the present invention is to provide a photosensitive resin composition which is excellent in the compatibility (dispersibility) of photosensitive resin composition components, developability with aqueous developer solution, water resistance, image reproducibility, print wear characteristics in printing with a water base ink and plate wiping-off resistance in removal of ink adhered to any printing plate. The present invention relates to a photosensitive resin composition comprising a hydrophilic copolymer (A) obtained by copolymerizing at least (1) 2 to 15 parts by mass of an unsaturated monomer having a carboxyl group, (2) 50 to 80 parts by mass of a conjugated diene-type monomer, (3) 3 to 20 parts by mass of an aromatic vinyl compound, and (4) 3 to 30 parts by mass of an alkyl (meth)acrylate.
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“Alkyl”, Dictionary.com/alkyl, 3 pages, Copyright 2004, Lexico Publishing Group, LLC.
Nippon Paint Co LTD, English machine translation of JP 10-148931 cited by applicants, from Patent Abstracts of Japan, date o reference translated, Jun. 2, 1998, 17 pages with abstract.
Araki Yoshifumi
Kobayashi Hiromi
Asahi Kasei Chemicals Corporation
Hamilton Cynthia
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