Water developable photosensitive resin composition

Details Water developable photosensitive resin composition Water developable photosensitive resin composition

1986-01-27

1986-08-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430909, 430910, 522109, 522112, G03C 168

Patent

active

046069933

ABSTRACT:
A photosensitive resin composition comprising components A, B and C described below is provided. The composition of the present invention is quite effectively usable for the preparation of photosensitive resin printing plates having excellent water developability, image reproducibility and printability. The composition comprises:

REFERENCES:
patent: 3630746 (1971-12-01), Takimoto et al.
patent: 3801328 (1974-04-01), Takimoto et al.
patent: 3898287 (1975-08-01), Brutchen et al.
patent: 3961961 (1976-06-01), Rich
patent: 4272611 (1981-06-01), Vyvial et al.
patent: 4289865 (1981-09-01), Wilson
patent: 4293635 (1981-10-01), Flint et al.
patent: 4454219 (1984-06-01), Yamadera et al.
Chemical Abstract, vol. 93, No. 7, p. 559, No. 141050y.

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