Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-12-17
1992-12-29
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430 18, 430286, 430306, 430325, 430910, 430919, 430920, G03C 173
Patent
active
051750767
DESCRIPTION:
BRIEF SUMMARY
FIELD OF THE INVENTION
This invention relates to a water-developable photosensitive plate and its production. More particularly, it relates to a water-developable photosensitive resin plate having a solid form stability, which is suitable for the manufacture of a printing plate, especially a relief printing plate, having excellent chemical and physical properties such as high resistance to water based inks, high abrasion resistance and good resilience.
BACKGROUND OF THE INVENTION
A photosensitive resin plate for the manufacture of a relief printing plate is preferably developable with water rather than organic solvents for various reasons such as easiness of handling, health of the working people, safety, and avoidance of environmental pollution. On printing with a relief printing plate resulting from the photosensitive resin plate, it is also very desirable to be able to use water based inks, because oil based inks tend to mist and hence to cause health problems. In addition, the use of water based inks is favored in that the resulting print will not show through the printed paper from one side to the other and does not tend to rub off on the fingers.
There are various known photosensitive resin plates. The photosensitive resin compositions for those conventional photosensitive resin plates are based on liquid unsaturated polyesters, polyvinyl alcohols, water soluble polyamides, cellulose acetate succinates, alcohol soluble polyamides, etc. All these materials, however, suffer from significant disadvantages. For instance, the liquid unsaturated polyesters are inconvenient to handle and necessitate the use of an alkaline solution or a special air knife for developing. The polyvinyl alcohols and the water soluble polyamides have extremely low resistance to water, and consequently water based inks are not usable. The cellulose acetate succinates require the use of an alkaline solution for development, and the alcohol soluble polyamides require the use of an inflammable alcohol.
U.S. Pat. No. 3,801,328 discloses a water developable photopolymerizable composition for preparation of a photosensitive resin plate, said composition comprising unsaturated ethylenic monomers, a photo-polymerization initiator and a partially saponified polyvinyl acetate. This composition has been found to be developed very satisfactorily with water to give a relief printing plate. However, the water resistance of this relief printing plate at the surface is low, which in turn precludes its use with a water based ink.
SUMMARY OF THE INVENTION
According to this invention, there is provided a water developable photosensitive resin plate suitable for the manufacture of a relief printing plate highly resistant to water based inks, which comprises (A) a copolymer comprising (i) an aliphatic conjugated diene monomer, (ii) an .alpha., .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha., .beta.-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofuntional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components, (B) a basic nitrogen atom-containing compound, (C) an ethylenically unsaturated monomer and (D) a photopolymerization initiator.
As stated above, the photosensitive resin plate of the invention is characterized by good water developability, and the printing plate obtained therefrom is characterized by high water resistance. Both the photosensitive resin plate and the printing plate are also characterized by having excellent solid form stability, i.e., shape and size stability. In addition, the printing plate has high abrasion resistance and good resilience. Therefore, the printing plate is particularly suitable for flexographic printing, which is often carried out with water based inks.
DE
REFERENCES:
patent: 3801328 (1974-04-01), Takimoto et al.
patent: 4239849 (1980-12-01), Lipson et al.
patent: 4289843 (1981-09-01), Boutle et al.
patent: 4464457 (1984-08-01), Bosse et al.
patent: 4485167 (1984-11-01), Briney et al.
patent: 4537855 (1985-08-01), Ide et al.
patent: 4621243 (1986-11-01), Gervey
Ishikawa Katsukiyo
Konishi Katsuji
Kusuda Hidefumi
Brammer Jack P.
Nippon Paint Co. Ltd.
LandOfFree
Water-developable photosensitive composition for producing relie does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water-developable photosensitive composition for producing relie, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water-developable photosensitive composition for producing relie will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1886436