Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-08-02
1988-09-20
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430909, 430288, 430286, 430922, 430920, 430281, 522 26, 522 28, 522904, 522121, 522117, G03C 170
Patent
active
047725389
ABSTRACT:
This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture
REFERENCES:
patent: 2405523 (1974-11-01), Sease et al.
patent: 3396019 (1968-08-01), Uhlig
patent: 3619419 (1972-07-01), Gillich
patent: 3847614 (1974-11-01), Mattor
patent: 3867147 (1975-02-01), Teuscher
patent: 3926643 (1975-12-01), Chang
patent: 3954475 (1976-05-01), Bonham et al.
patent: 4070262 (1978-01-01), Guarino et al.
patent: 4115232 (1978-09-01), Nyi et al.
Kirk-Othmar, "Encyclopedia of Polymer Science & Technology," vol. 14, pp. 208-213, 217-230, 271.
Pagano Frank C.
Walls John E.
American Hoechst Corporation
Hamilton Cynthia
Michl Paul R.
Roberts Richard S.
LandOfFree
Water developable lithographic composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water developable lithographic composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water developable lithographic composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1748215