Water-borne, alkali-developable, photoresist coating composition

Details Water-borne, alkali-developable, photoresist coating composition Water-borne, alkali-developable, photoresist coating composition

1990-03-12

1991-09-03

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 522 39, 522 42, 522 44, 522 46, 522 53, 522 63, 524533, 524534, G03C 173, G03F 733

Patent

active

050454358

ABSTRACT:
An aqueous photopolymer composition is produced by adding a monomer to a latex of a partially neutralized carboxylated acrylic copolymer, having an acid number greater than 80, along with photoinitator and components to produce an aqueous coatable and alkali developable photoresist composition. Preferred neutralization is 30-50% for dip-coating and 40-60% for screen-printing to produce 1 mil lines and 1 mil space after ultraviolet exposure and mild alkali development.

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