Water-based photoresists using stilbene compounds as crosslinkin

Details Water-based photoresists using stilbene compounds as crosslinkin Water-based photoresists using stilbene compounds as crosslinkin

1980-11-24

1981-11-10

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415914, 20415915, 430271, 430281, 430311, 430905, 430909, G03C 168

Patent

active

042999103

ABSTRACT:
Improved aqueous photoresist compositions comprising a water-soluble polymeric material and a photosensitive cross-linking agent, therefore, having the formula: ##STR1## wherein, A and B are independently amino or nitro and M is an alkali metal or ammonium ion, and process of exposing and developing same.

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patent: 4099973 (1978-07-01), Miura et al.
patent: 4108887 (1978-08-01), Fleck et al.
patent: 4118182 (1978-10-01), Smith
patent: 4255513 (1981-03-01), Laridon et al.
patent: 4259432 (1981-03-01), Hondoh et al.

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