Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1989-08-31
1990-06-12
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430909, 522116, 522 40, 522 48, 522 68, G03C 170
Patent
active
049332600
ABSTRACT:
A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.
REFERENCES:
patent: 3801328 (1974-04-01), Takimoto et al.
patent: 3897295 (1975-07-01), Dowbenko et al.
patent: 4572887 (1986-02-01), Geissler
Aoyama Toshimi
Katsumata Naoya
Nakazato Syunzi
Ohta Katsuyuki
Hamilton Cynthia
Michl Paul R.
Tokyo Ohka Kogyo Co. Ltd.
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