Water-based photopolymerizable compositions and their use

Details Water-based photopolymerizable compositions and their use Water-based photopolymerizable compositions and their use

1984-03-30

1985-10-22

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430292, 430909, 430914, 430921, 430925, 430922, 430926, 430912, 20415918, G03C 168

Patent

active

045488908

ABSTRACT:
Aqueous dispersions comprising water, a cationically curable compound, and a photosensitive onium salt, and preferably other ingredients such as sensitizers, fillers, and plasticizers, are useful for making printing screens, lithographic plates, and printed circuit resists. After exposure, the un-cured composition is easily removed by washing with water.

REFERENCES:
patent: 3637382 (1972-01-01), Krauch
patent: 3708296 (1973-01-01), Schlesinger
patent: 3782952 (1974-01-01), Golda et al.
patent: 4069054 (1978-01-01), Smith
patent: 4136102 (1979-01-01), Crivello
patent: 4175972 (1979-11-01), Crivello
patent: 4286047 (1981-08-01), Bennett et al.
patent: 4341859 (1982-07-01), Keane et al.
patent: 4378277 (1983-03-01), Smith
patent: 4418138 (1983-11-01), Curtis

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