Water and aqueous base soluble antireflective...

Details Water and aqueous base soluble antireflective... Water and aqueous base soluble antireflective...

2007-02-13

2007-02-13

Walke, Amanda C (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S272100, C430S313000, C430S011000, C438S712000, C438S789000

Reexamination Certificate

active

10666541

ABSTRACT:
A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and disposed on the first layer a second layer which includes an energy photoactive material.

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