Waste gas processing apparatus and method for semiconductor fabr

Details Waste gas processing apparatus and method for semiconductor fabr Waste gas processing apparatus and method for semiconductor fabr

1996-09-24

1998-04-28

Smith, Duane S.

Gas separation: processes

Liquid contacting

And filtration of gas

55259, 55261, 55265, 45216, 96189, B01D 5000, B01D 4700

Patent

active

057439397

ABSTRACT:
The waste gas processing apparatus and method thereof for semiconductor device fabricating equipment includes a water spraying chamber, and an exhaust tube. A demister and an external gas introducer, for causing external gas to enter the exhaust tube adjacent the demister, are installed in the exhaust tube.

REFERENCES:
patent: 2999560 (1961-09-01), Seefluth
patent: 3755990 (1973-09-01), Hardison
patent: 3823531 (1974-07-01), Crawley
patent: 3844740 (1974-10-01), Brandt
patent: 3883329 (1975-05-01), Dupps, Sr.
patent: 4022593 (1977-05-01), Lerner

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