Wafer transport apparatus for ion implantation apparatus

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

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2504922, G21K 510

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active

050049240

ABSTRACT:
A wafer transport apparatus for an ion implantation apparatus includes means for successively transferring wafers from a wafer cassette, inserting the wafers into an auxiliary vacuum chamber, transferring the wafers into a specific position within a vacuum processing chamber, transferring a wafer from that position to a position for ion implantation processing while at the same time transferring a processed wafer to a second position within the vacuum processing chamber, with the wafers being held retained during this transfer, successively transferring the processed wafers into a second auxiliary vacuum chamber, and transporting the wafers from the second auxiliary vacuum chamber to be inserted into a cassette, e.g. the cassette from which the wafers were originally removed. The wafers are supported or held retained by the transfer and transport means during the entire process, so that problems resulting from gravity feed of wafers along inclined surfaces, which arise with prior art apparatus of this type, are eliminated.

REFERENCES:
patent: 3968885 (1976-07-01), Hassan et al.
patent: 4550239 (1985-10-01), Nehara et al.
patent: 4553069 (1985-11-01), Purser
patent: 4558984 (1985-12-01), Garrett
patent: 4619573 (1986-10-01), Rathmann et al.
patent: 4643629 (1987-02-01), Takahashi et al.

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