Wafer transfer apparatus for use in a film deposition furnace

Details Wafer transfer apparatus for use in a film deposition furnace Wafer transfer apparatus for use in a film deposition furnace

1996-02-29

1996-12-10

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118718, 118500, 118 50, 414940, 414156, 414198, 432253, C23C 1600

Patent

active

055826490

ABSTRACT:
A boat, carrying wafers to be processed, is pushed into a furnace by a substantially elongated and cantilevered actuator arm having a lug that pushes by first rotating the arm, to cause the lug to traverse a vertical rod attached to against a plate affixed to the boat. The boat is later pulled out of the furnace the boat, and thereafter pulling on the arm to enable the lug to pull against the vertical rod to withdraw the boat. Reliable operation is attained regardless of sagging of the actuator arm relative to the boat.

REFERENCES:
patent: 3819067 (1974-06-01), Hammond
patent: 4129090 (1978-12-01), Inaniwa
patent: 4287851 (1981-09-01), Dozier
patent: 4439146 (1984-03-01), Sugita
patent: 4487161 (1984-12-01), Hirata
patent: 4793283 (1988-12-01), Sarkozy
R. M. Defries, Wafer Carrier, IBM Technical Disclosure Bulletin vol. 11, No. 12, 1685-1686.
A. M. Lowen, Design for a Quartz Boat to Process Ceramic Substrates, IBM Technical Disclosure Bulletin vol. 24 No. 6, 2967-2968.

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