Wafer supporting jig and a decompressed gas phase growth method

Coating processes – Coating by vapor – gas – or smoke

Patent

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Details

427255, 118725, 118728, 118500, 437925, C23C 1646

Patent

active

051696843

ABSTRACT:
A there is disclosed a wafer supporting jig that allows formation of a film with an even thickness on a wafer as well as a decompressed gas-phase growth method utilizing such a jig.
A wafer supporting jig according to the invention is realized in the form of a ring made of a heat-resistive material having a central opening.

REFERENCES:
patent: 3918756 (1975-11-01), Saville
patent: 5042423 (1991-08-01), Wilkinson
IBM Tech Dis Bul. vol. 22, No. 12 May 1980.

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