Coating apparatus – Gas or vapor deposition – Work support
Patent
1991-05-14
1992-12-08
Wilczewski, Mary
Coating apparatus
Gas or vapor deposition
Work support
437925, 118726, 118500, B05C 1302, H01L 2131, H01L 21205
Patent
active
051694530
ABSTRACT:
A wafer supporting jig that allows formation of a film with an even thickness on a wafer as well as a decompressed gas-phase growth method utilizing such a jig.
A wafer supporting jig according to the invention is realized in the form of a ring made of a heat-resistive material having a central opening.
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patent: 4589369 (1986-05-01), Mahler
patent: 4592308 (1986-06-01), Shih et al.
patent: 4877573 (1989-10-01), Nilsson
patent: 5054418 (1991-10-01), Thompson et al.
Toyoko Kagaku Co., Ltd.
Wilczewski Mary
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