Wafer support with improved temperature control

Details Wafer support with improved temperature control Wafer support with improved temperature control

1996-11-05

2000-03-07

Lund, Jeffrie R

Coating apparatus

Work holders, or handling devices

118715, 118728, 156345, 20429815, 361234, 279128, C23C 1600, C23C 1400

Patent

active

060334789

ABSTRACT:
Apparatus for supporting a workpiece. The apparatus has either a mechanical or electrostatic chuck having a workpiece support surface that specifically directs the flow of a heat transfer gas from at least one gas supply port towards a drain port. A pressure valve beyond the drain port regulates heat transfer gas pressure to ensure adequate gas density for cooling by conduction and adequate gas flow for controlled leakage through the valve.

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