Wafer stage with a magnet

Details Wafer stage with a magnet Wafer stage with a magnet

2007-01-16

2007-01-16

Jackson, Stephen W. (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C438S005000, C438S710000, C156S345420

Reexamination Certificate

active

10906435

ABSTRACT:
A wafer stage for holding a wafer in a chamber of a plasma processing system, the wafer stage includes an electrode on which a wafer is placed, to which electrical current is supplied, a diameter of the electrode is larger than a diameter of said wafer, a plurality of magnets separately arranged on an outermost region of said electrode and said magnets are arranged such that alternate magnetic poles face towards the inside of the chamber, and an outer-ring placed around said wafer, the outer ring having a magnetic metal ring at a lower side.

REFERENCES:
patent: 2004/0009617 (2004-01-01), Masuda et al.
patent: 2004/0196127 (2004-10-01), Perrin
patent: 05-291194 (1993-11-01), None
patent: 06-061336 (1994-03-01), None
patent: 07-086382 (1995-03-01), None
patent: 09-134892 (1997-05-01), None

Affiliated with

Also associated with

Rating

Wafer stage with a magnet does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer stage with a magnet, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer stage with a magnet will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3725197