Wafer spinner having a heat controller for fabricating a semicon

Details Wafer spinner having a heat controller for fabricating a semicon Wafer spinner having a heat controller for fabricating a semicon

1997-11-13

1999-08-03

Edwards, Laura

Coating apparatus

With means to centrifuge work

118 58, 118 59, 118500, 392416, 392418, 219390, 219405, 219411, B05C 1300

Patent

active

059320095

ABSTRACT:
A spinner which distributes a photoresist on a wafer in a semiconductor device fabrication apparatus includes a rotation-plate vacuum chuck which holds a wafer, a driving motor which rotates the chuck and a temperature controller assembly. The temperature controller assembly maintains a temperature distribution along the chuck within a predetermined temperature-distribution range. The temperature controller assembly includes a non-contact thermometer, a non-contact variable heater, and a heat regulator. By controlling the temperature in the chuck, a photoresist layer can be coated on a wafer with more uniform thickness than if the temperature were not controlled.

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