Wafer reactor vessel window with pressure-thermal compensation

Details Wafer reactor vessel window with pressure-thermal compensation Wafer reactor vessel window with pressure-thermal compensation

1990-09-07

1992-02-04

Lusignan, Michael

Coating processes

Electrical product produced

Welding electrode

4272481, 118620, 118715, 118719, 118725, 118733, 118724, C23C 1648, C23C 1656

Patent

active

050858874

ABSTRACT:
A quartz window for a wafer reactor vessel has a flat bow for withstanding the pressure differential between the ambient outside pressure and the reduced pressure in the wafer chamber. The bow is enhanced at elevated operating temperatures to compensate for the flattening effect of higher pressure differentials. The enhanced bowing is provided by a rigid peripheral flange which radially confines the window. The thermal expansion within the window is not expressed radially, but is directed outward to increase the bow.

REFERENCES:
patent: 3721210 (1973-03-01), Helms et al.
patent: 4920918 (1990-05-01), Adams et al.
patent: 4958061 (1990-09-01), Wakabayashi et al.
patent: 5000113 (1991-03-01), Wang et al.

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