Wafer processing apparatus having a tunable electrical...

Details Wafer processing apparatus having a tunable electrical... Wafer processing apparatus having a tunable electrical...

2011-04-19

2011-04-19

Nguyen, Danny (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C361S230000

Reexamination Certificate

active

07929269

ABSTRACT:
An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.

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