Coating apparatus – Gas or vapor deposition
Patent
1999-02-09
2000-12-12
Mills, Gregory
Coating apparatus
Gas or vapor deposition
118728, 156345, C23C 1600, H04H 100
Patent
active
061592994
ABSTRACT:
A wafer pedestal with a purge ring that circumscribes a peripheral edge of the wafer pedestal. The purge ring contains plurality of passages that are located proximate the peripheral edge of said wafer pedestal such that purge gas is directed towards the peripheral edge. Additionally, the purge ring cooperates with an edge ring assembly that circumscribes the purge ring. The purge ring and the edge ring assembly allow a dual-purge flow pattern to be established, which significantly reduces the accumulation of undesirable deposits upon the wafer pedestal.
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Ellwanger Russell C.
Koai Keith K.
Lei Lawrence Chung-Lai
Applied Materials Inc.
Hassanzadeh Parviz
Mills Gregory
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