Wafer orientation inspection system

Details Wafer orientation inspection system Wafer orientation inspection system

1996-10-10

2000-09-19

Hiteshew, Felisa

Single-crystal, oriented-crystal, and epitaxy growth processes;

Forming from vapor or gaseous state

With decomposition of a precursor

117200, 117201, 117900, C30B 3112

Patent

active

061206016

ABSTRACT:
An apparatus and method for precisely calibrating the transfer arm of a multiple station wafer processing system without breaking vacuum and with a minimum of system downtime is provided. A system of determining and properly aligning the crystallographic orientation of the wafers before processing as well as monitoring the orientation of individual wafers during wafer transfer between processing stations is also provided.

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