Wafer loading apparatus for beam treatment

Details Wafer loading apparatus for beam treatment Wafer loading apparatus for beam treatment

1979-05-23

1980-10-14

Dixon, Harold A.

Radiant energy

Luminophor irradiation

250309, 250492B, A61K 2702, H01J 938

Patent

active

042283582

ABSTRACT:
Ion implantation equipment of the spinning disk type has an automated disk exchange system employing a pair of arms that interchange disks between a pair of exchange stations. One exchange station is defined by a back cover of a target chamber that hinges down. The disk drive motor is mounted on that cover and introduces water cooling for the disk through the drive shaft. Heat conductive elastomeric material interposed between the disk and its support on the shaft ensures good heat transfer from the disk in a high vacuum environment. The exchange system employs linear and rotary actuators of the fluid cylinder type, and the pickup head employs a pneumatic robot that operates a toggle clamp that secures the disk for its scanning rotation.

REFERENCES:
PR-200 Ion Implantation System by Bird et al., J. Vac. Sci. Technol. 15(3), May Jun. 1978, pp. 1080-1085.

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