Wafer level underfill and interconnect process

Active solid-state devices (e.g. – transistors – solid-state diode – Encapsulated

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S788000, C257S789000, C257S793000, C257S795000

Reexamination Certificate

active

06967412

ABSTRACT:
A chip scale package and a method for its manufacture which include providing sticky interconnects on a surface of a semiconductor die, the interconnects being surrounded by a layer of thermal epoxy.

REFERENCES:
patent: 3494023 (1970-02-01), Dorendorf
patent: 3561107 (1971-02-01), Best et al.
patent: 3871014 (1975-03-01), King et al.
patent: 3972062 (1976-07-01), Hopp
patent: 4021838 (1977-05-01), Warwick
patent: 4604644 (1986-08-01), Beckham et al.
patent: 5019944 (1991-05-01), Ishii et al.
patent: 5136365 (1992-08-01), Pennisi et al.
patent: 5173369 (1992-12-01), Kataoka
patent: 5217922 (1993-06-01), Akasaki et al.
patent: 5311402 (1994-05-01), Kobayashi et al.
patent: 5313366 (1994-05-01), Gaudenzi et al.
patent: 5367435 (1994-11-01), Andros et al.
patent: 5371404 (1994-12-01), Juskey et al.
patent: 5381039 (1995-01-01), Morrison
patent: 5394490 (1995-02-01), Kato et al.
patent: 5397921 (1995-03-01), Karnezos
patent: 5447886 (1995-09-01), Rai
patent: 5448114 (1995-09-01), Kondoh et al.
patent: 5450283 (1995-09-01), Lin et al.
patent: 5454160 (1995-10-01), Nickel
patent: 5458694 (1995-10-01), Nuyen
patent: 5474620 (1995-12-01), Nath et al.
patent: 5477087 (1995-12-01), Kawakita et al.
patent: 5484648 (1996-01-01), Odashima et al.
patent: 5492863 (1996-02-01), Higgins, III
patent: 5510758 (1996-04-01), Fujita et al.
patent: 5512786 (1996-04-01), Imamura et al.
patent: 5532512 (1996-07-01), Fillion et al.
patent: 5554887 (1996-09-01), Sawai et al.
patent: 5559444 (1996-09-01), Farnworth et al.
patent: 5578869 (1996-11-01), Hoffman et al.
patent: 5604445 (1997-02-01), Desai et al.
patent: 5634267 (1997-06-01), Farnworth et al.
patent: 5654590 (1997-08-01), Kuramochi
patent: 5661042 (1997-08-01), Fang et al.
patent: 5668059 (1997-09-01), Christie et al.
patent: 5674780 (1997-10-01), Lytle et al.
patent: 5703405 (1997-12-01), Zeber
patent: 5709336 (1998-01-01), Ingraham et al.
patent: 5726489 (1998-03-01), Matsuda et al.
patent: 5726501 (1998-03-01), Matsubara
patent: 5726502 (1998-03-01), Beddingfield
patent: 5729440 (1998-03-01), Jimarez et al.
patent: 5734201 (1998-03-01), Djennas et al.
patent: 5739585 (1998-04-01), Akram et al.
patent: 5789278 (1998-08-01), Akram et al.
patent: 5813870 (1998-09-01), Gaynes et al.
patent: 5814401 (1998-09-01), Gamota et al.
patent: 5814894 (1998-09-01), Igarashi et al.
patent: 5847022 (1998-12-01), Yamashina et al.
patent: 5861678 (1999-01-01), Schrock
patent: 5910641 (1999-06-01), Gaynes et al.
patent: 5925930 (1999-07-01), Farnworth et al.
patent: 5931371 (1999-08-01), Pao et al.
patent: 5931685 (1999-08-01), Hembree et al.
patent: 5940729 (1999-08-01), Downes, Jr. et al.
patent: 5977642 (1999-11-01), Appelt et al.
patent: 5990566 (1999-11-01), Farnworth et al.
patent: 6002180 (1999-12-01), Akram et al.
patent: 6016060 (2000-01-01), Akram et al.
patent: 6040702 (2000-03-01), Hembree et al.
patent: 6077723 (2000-06-01), Farnworth et al.
patent: 6097087 (2000-08-01), Farnworth et al.
patent: 6107122 (2000-08-01), Wood et al.
patent: 6133634 (2000-10-01), Joshi
patent: 6150726 (2000-11-01), Feilchenfeld et al.
patent: 6194788 (2001-02-01), Gilleo et al.
patent: 6259036 (2001-07-01), Farnworth
patent: 6391687 (2002-05-01), Cabahug et al.
patent: 6744124 (2004-06-01), Chang et al.
patent: 2001/0050441 (2001-12-01), Shivkumar et al.
patent: 5-129516 (1993-05-01), None
patent: 7-94554 (1995-04-01), None
MOSFET BGA Design Guide 2004-Fairchild Semiconductor, pp. i-ii and pp. 1-43.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Wafer level underfill and interconnect process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer level underfill and interconnect process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer level underfill and interconnect process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3507918

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.