Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates
Reexamination Certificate
2006-03-14
2006-03-14
Geyer, Scott (Department: 2812)
Semiconductor device manufacturing: process
Bonding of plural semiconductor substrates
C438S105000
Reexamination Certificate
active
07012011
ABSTRACT:
An embodiment of the present invention is a technique to heat spread at wafer level. A silicon wafer is thinned. A chemical vapor deposition diamond (CVDD) wafer processed. The CVDD wafer is bonded to the thinned silicon wafer to form a bonded wafer. Metallization is plated on back side of the CVDD wafer. The CVDD wafer is reflowed to flatten the back side.
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patent: 5131963 (1992-07-01), Ravi
patent: 5622586 (1997-04-01), Vaitkus et al.
patent: 6428399 (2002-08-01), Tanabe et al.
Chrysler Gregory M.
Hu Chuan
Blakely , Sokoloff, Taylor & Zafman LLP
Geyer Scott
Intel Corporation
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