Wafer-level diamond spreader

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates

Reexamination Certificate

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C438S105000

Reexamination Certificate

active

07012011

ABSTRACT:
An embodiment of the present invention is a technique to heat spread at wafer level. A silicon wafer is thinned. A chemical vapor deposition diamond (CVDD) wafer processed. The CVDD wafer is bonded to the thinned silicon wafer to form a bonded wafer. Metallization is plated on back side of the CVDD wafer. The CVDD wafer is reflowed to flatten the back side.

REFERENCES:
patent: 4981818 (1991-01-01), Anthony et al.
patent: 5131963 (1992-07-01), Ravi
patent: 5622586 (1997-04-01), Vaitkus et al.
patent: 6428399 (2002-08-01), Tanabe et al.

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