Semiconductor device manufacturing: process – Semiconductor substrate dicing
Reexamination Certificate
2006-06-30
2008-10-14
Lebentritt, Michael (Department: 2829)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
C438S106000, C438S113000, C438S122000, C438S455000, C438S458000, C257S678000
Reexamination Certificate
active
07435664
ABSTRACT:
An embodiment of the present invention is a technique to fabricate a package. A metal sheet having trenches is formed. A thinned wafer supported by a wafer support substrate (WSS) is formed. The metal sheet is bonded to the WSS-supported thinned wafer to form a metal bonded thinned wafer. The thinned wafer is diced to the trenches into die assemblies.
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So, William W., et al., “High Temperature Joints Manufactured at Low Temperature”, IEEE, 1998, Electronics Components and Technology Conference, pp. 284-291.
Bock, K., et al., “New Manufacturing Concepts for Ultra-Thin Silicon and Gallium Arsenide Substrates”, 2003, International Conf. on Compound Semiconductor Mfg.
Lu Daoqiang
Tang John
Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Lebentritt Michael
Whalen Daniel
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