Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-05-10
2008-08-26
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400, C250S559450, C382S145000
Reexamination Certificate
active
07417724
ABSTRACT:
Wafer inspection systems and methods are provided. One inspection system includes a module measurement cell coupled to a host inspection system by a wafer handler. The module measurement cell is configured to inspect a wafer using one or more modes prior to inspection of the wafer by the host inspection system. The one or more modes include backside inspection, edge inspection, frontside macro defect inspection, or a combination thereof. Another inspection system includes two or more low resolution electronic sensors arranged at multiple viewing angles. The sensors are configured to detect light returned from a wafer substantially simultaneously. A method for analyzing inspection data includes selecting a template corresponding to a support device that contacts a backside of a wafer prior to inspection of the backside of the wafer. The method also includes subtracting data representing the template from inspection data generated by inspection of the backside of the wafer.
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Huet Patrick
Kren George
Piramuthu Robinson
Plihal Martin
Rosengaus Eliezer
Baker & McKenzie LLP
KLA-Tencor Technologies Corp.
Nguyen Sang
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