Wafer holding ring for chemical and mechanical polisher

Details Wafer holding ring for chemical and mechanical polisher Wafer holding ring for chemical and mechanical polisher

2005-05-24

2005-05-24

Nguyen, Dung Van (Department: 3723)

Abrading

Work holder

Work rotating

C451S285000

Reexamination Certificate

active

06896602

ABSTRACT:
Disclosed is a wafer-holding ring adapted for holding a wafer on a chemical mechanical polishing apparatus, which can prevent damage to a wafer, possesses excellent abrasion resistance, and can reduce replacement work and consequently can realize mass production of polished wafers. In the wafer-holding ring for a chemical mechanical polishing apparatus, the surface of the wafer-holding ring at least in its portion, which can come into contact with a wafer, is formed of a resin composition comprising not less than 30% by weight of polybenzimidazole.

REFERENCES:
patent: 26065 (1859-11-01), Wuterich et al.
patent: 3313783 (1967-04-01), Iwakura et al.
patent: 3408336 (1968-10-01), Benson
patent: 3433772 (1969-03-01), Chenevey et al.
patent: 3509108 (1970-04-01), Prince
patent: 3518234 (1970-06-01), Hara et al.
patent: 3549603 (1970-12-01), Chenevey
patent: 3555389 (1971-01-01), Opal
patent: 3578644 (1971-05-01), Trischler
patent: 3708439 (1973-01-01), Sayigh et al.
patent: 4154919 (1979-05-01), Sheratte
patent: 4312976 (1982-01-01), Choe
patent: 4377546 (1983-03-01), Helminiak et al.
patent: 4549388 (1985-10-01), Lancaster
patent: 5704494 (1998-01-01), Nishikiori et al.
patent: 5932688 (1999-08-01), Murata
patent: 6468136 (2002-10-01), Lum et al.
patent: 20020182867 (2002-12-01), Kajiwara et al.
patent: 0 392 855 (1990-10-01), None
patent: 0 392 856 (1990-10-01), None
patent: 1 065 030 (2001-01-01), None
English abstract for JP 7-147247, Jun. 6, 1995.
English abstract for JP 8-187657, Jul. 23, 1996.
English abstract for JP 2000-052241, Feb. 22, 2000.
English abstract for JP 2000-084837, Mar. 28, 2000.
Critchley, J.P., et al., “Heat-resistant polymers-technologically useful materials”, Plenum press, New York, 1983, pp. 256-322.

Affiliated with

Also associated with

Rating

Wafer holding ring for chemical and mechanical polisher does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer holding ring for chemical and mechanical polisher, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer holding ring for chemical and mechanical polisher will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3400828