Wafer holding device in an exposure apparatus

Details Wafer holding device in an exposure apparatus Wafer holding device in an exposure apparatus

1991-11-01

1993-06-15

Dzierzynski, Paul M.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

25044011, 622592, 16510421, H01J 3730

Patent

active

052201716

ABSTRACT:
A substrate holding device includes a chuck having an attracting surface for holding a substrate, an inside space and an inside heat pipe structure provided in the inside space, the heat pipe structure removing generated heat by evaporation of a liquid medium; a temperature controlling block having a structure that allows flow of a temperature controlling medium therethrough, the temperature controlling block being thermally coupled to the attracting surface of the chuck through the heat pipe structure; and a stage for moving the chuck and the temperature controlling block as a unit, and for supporting the chuck through the temperature controlling block.

REFERENCES:
patent: 5093579 (1992-03-01), Amemiya et al.
patent: 5126571 (1992-06-01), Sakai

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